国际简称:OPT LASER TECHNOL 参考译名:光学和激光技术
主要研究方向:物理-光学 非预警期刊 审稿周期: 约2.1个月 约9周
《光学和激光技术》(Optics And Laser Technology)是一本由Elsevier Ltd出版的以物理-光学为研究特色的国际期刊,发表该领域相关的原创研究文章、评论文章和综述文章,及时报道该领域相关理论、实践和应用学科的最新发现,旨在促进该学科领域科学信息的快速交流。该期刊是一本未开放期刊,近三年没有被列入预警名单。该期刊享有很高的科学声誉,影响因子不断增加,发行量也同样高。
Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication.
The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas:
•development in all types of lasers
•developments in optoelectronic devices and photonics
•developments in new photonics and optical concepts
•developments in conventional optics, optical instruments and components
•techniques of optical metrology, including interferometry and optical fibre sensors
•LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow
•applications of lasers to materials processing, optical NDT display (including holography) and optical communication
•research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume)
•developments in optical computing and optical information processing
•developments in new optical materials
•developments in new optical characterization methods and techniques
•developments in quantum optics
•developments in light assisted micro and nanofabrication methods and techniques
•developments in nanophotonics and biophotonics
•developments in imaging processing and systems
CiteScore | SJR | SNIP | CiteScore 指数 | ||||||||||||||||
8.3 | 0.874 | 1.577 |
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名词解释:CiteScore 是衡量期刊所发表文献的平均受引用次数,是在 Scopus 中衡量期刊影响力的另一个指标。当年CiteScore 的计算依据是期刊最近4年(含计算年度)的被引次数除以该期刊近四年发表的文献数。例如,2022年的 CiteScore 计算方法为:2022年的 CiteScore =2019-2022年收到的对2019-2022年发表的文件的引用数量÷2019-2022年发布的文献数量 注:文献类型包括:文章、评论、会议论文、书籍章节和数据论文。
Top期刊 | 综述期刊 | 大类学科 | 小类学科 | ||
是 | 否 | 物理与天体物理 | 2区 | OPTICS 光学 PHYSICS, APPLIED 物理:应用 | 2区 2区 |
Top期刊 | 综述期刊 | 大类学科 | 小类学科 | ||
否 | 否 | 物理与天体物理 | 2区 | OPTICS 光学 PHYSICS, APPLIED 物理:应用 | 2区 2区 |
Top期刊 | 综述期刊 | 大类学科 | 小类学科 | ||
否 | 否 | 物理与天体物理 | 2区 | OPTICS 光学 PHYSICS, APPLIED 物理:应用 | 2区 2区 |
Top期刊 | 综述期刊 | 大类学科 | 小类学科 | ||
否 | 否 | 物理 | 2区 | OPTICS 光学 PHYSICS, APPLIED 物理:应用 | 2区 3区 |
Top期刊 | 综述期刊 | 大类学科 | 小类学科 | ||
否 | 否 | 物理与天体物理 | 2区 | OPTICS 光学 PHYSICS, APPLIED 物理:应用 | 2区 2区 |
Top期刊 | 综述期刊 | 大类学科 | 小类学科 | ||
否 | 否 | 物理与天体物理 | 2区 | OPTICS 光学 PHYSICS, APPLIED 物理:应用 | 2区 2区 |
按JIF指标学科分区 | 收录子集 | 分区 | 排名 | 百分位 |
学科:OPTICS | SCIE | Q1 | 21 / 119 |
82.8% |
学科:PHYSICS, APPLIED | SCIE | Q2 | 45 / 179 |
75.1% |
按JCI指标学科分区 | 收录子集 | 分区 | 排名 | 百分位 |
学科:OPTICS | SCIE | Q1 | 20 / 120 |
83.75% |
学科:PHYSICS, APPLIED | SCIE | Q1 | 29 / 179 |
84.08% |
Author: Yu, Jinsu; Chen, Jiangyi; Ho, Hsinshen
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 157, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108721
Author: Wang, Xi-xin; Lv, Ri-qing; Zhao, Yong; Zhao, Jian; Lin, Zi-ting
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 157, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108748
Author: Sattar, Harse; Ran, Hai; Hu, Zhenlin; Guan, Feiyu; Imran, Muhammad; Guo, Lianbo; Luo, Wei; Ding, Hongbin
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 157, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108741
Author: Liu, Yayun; Zhu, Qi; Wang, Chuanyang; Li, Jiaqiang
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 157, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108774
Author: Lu, Yang; Deng, Yuchun; Shi, Lin; Jiang, Laihege; Gao, Ming
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 159, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.109003
Author: Sun, Shijie; Che, Yuanhua; Zhu, Mu; Lian, Tianhang; Sun, Xueqing; Wang, Xibin; Huang, Quandong; Zhang, Daming
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 159, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.109017
Author: Han, Lei; Gao, Qiang; Li, Bo; Li, Zhongshan
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 159, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.109014
Author: Xu, Mengbing; Ma, Hao; Zhong, Xueting; Zhao, Qun; Chen, Siyun; Zhong, Ruofei
Journal: OPTICS AND LASER TECHNOLOGY. 2023; Vol. 159, Issue , pp. -. DOI: 10.1016/j.optlastec.2022.108950
Epl
中科院 4区 JCR Q2
Japanese Journal Of Applied Physics
中科院 4区 JCR Q3
Journal Of Nonlinear Mathematical Physics
中科院 4区 JCR Q2
Optics Express
中科院 2区 JCR Q2
Journal Of Low Temperature Physics
中科院 3区 JCR Q4
Photonics
中科院 4区 JCR Q2
Journal Of Optical Technology
中科院 4区 JCR Q4
Optics And Laser Technology
中科院 2区 JCR Q1
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