Plasma Chemistry And Plasma Processing SCIE

国际简称：PLASMA CHEM PLASMA P 参考译名：等离子化学和等离子处理

主要研究方向：工程技术-工程：化工非预警期刊审稿周期：较慢,6-12周

《等离子化学和等离子处理》(Plasma Chemistry And Plasma Processing)是一本由Springer US出版的以工程技术-工程：化工为研究特色的国际期刊，发表该领域相关的原创研究文章、评论文章和综述文章，及时报道该领域相关理论、实践和应用学科的最新发现，旨在促进该学科领域科学信息的快速交流。该期刊是一本未开放期刊，近三年没有被列入预警名单。

3区中科院分区
Q2 JCR分区
123 年发文量
2.6 IF影响因子
未开放 是否OA
57 H-index
1981 创刊年份
Quarterly 出版周期
English 出版语言

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

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Plasma Chemistry And Plasma Processing期刊信息

ISSN：0272-4324
出版语言：English
是否OA：未开放
E-ISSN：1572-8986
出版地区：UNITED STATES
是否预警：否
出版商：Springer US
出版周期：Quarterly
创刊时间：1981
开源占比：0.0935
Gold OA文章占比：14.18%
OA被引用占比：0.0820...
出版国人文章占比：0.18
出版撤稿占比：0
研究类文章占比：95.12%

Plasma Chemistry And Plasma Processing CiteScore评价数据（2024年最新版）

CiteScore

SJR

SNIP

CiteScore 指数

5.9

0.48

0.912

学科类别	分区	排名	百分位
大类：Physics and Astronomy 小类：Condensed Matter Physics	Q1	108 / 434	75%
大类：Physics and Astronomy 小类：Surfaces, Coatings and Films	Q2	34 / 132	74%
大类：Physics and Astronomy 小类：General Chemical Engineering	Q2	79 / 273	71%
大类：Physics and Astronomy 小类：General Chemistry	Q2	119 / 408	70%

名词解释：CiteScore 是衡量期刊所发表文献的平均受引用次数，是在 Scopus 中衡量期刊影响力的另一个指标。当年CiteScore 的计算依据是期刊最近4年（含计算年度）的被引次数除以该期刊近四年发表的文献数。例如，2022年的 CiteScore 计算方法为：2022年的 CiteScore =2019-2022年收到的对2019-2022年发表的文件的引用数量÷2019-2022年发布的文献数量注：文献类型包括：文章、评论、会议论文、书籍章节和数据论文。

Plasma Chemistry And Plasma Processing中科院评价数据

中科院 2023年12月升级版

Top期刊	综述期刊	大类学科		小类学科
否	否	物理与天体物理	3区	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用 PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体	3区 3区 3区

中科院 2022年12月升级版

Top期刊	综述期刊	大类学科		小类学科
否	否	工程技术	3区	PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体 ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用	2区 3区 3区

中科院 2021年12月旧的升级版

Top期刊	综述期刊	大类学科		小类学科
否	否	工程技术	3区	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用 PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体	3区 3区 3区

中科院 2021年12月基础版

Top期刊	综述期刊	大类学科		小类学科
否	否	工程技术	3区	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用 PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体	4区 3区 2区

中科院 2021年12月升级版

Top期刊	综述期刊	大类学科		小类学科
否	否	工程技术	3区	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用 PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体	3区 3区 3区

中科院 2020年12月旧的升级版

Top期刊	综述期刊	大类学科		小类学科
否	否	工程技术	3区	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用 PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体	3区 3区 3区

Plasma Chemistry And Plasma Processing JCR评价数据（2023-2024年最新版）

按JIF指标学科分区	收录子集	分区	排名	百分位
学科：ENGINEERING, CHEMICAL	SCIE	Q3	91 / 170	46.8%
学科：PHYSICS, APPLIED	SCIE	Q2	81 / 179	55%
学科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	12 / 40	71.3%

按JCI指标学科分区	收录子集	分区	排名	百分位
学科：ENGINEERING, CHEMICAL	SCIE	Q2	55 / 171	68.13%
学科：PHYSICS, APPLIED	SCIE	Q2	69 / 179	61.73%
学科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	17 / 40	58.75%

Plasma Chemistry And Plasma Processing历年数据统计

影响因子

中科院分区

Plasma Chemistry And Plasma Processing中国学者发文选摘

1、Plasma-Catalytic Ammonia Decomposition for Carbon-Free Hydrogen Production Using Low Pressure-Synthesized Mo2N Catalyst
Author: Yu, Xiuxia; Hu, Ke; Zhang, Huazhou; He, Ge; Xia, Yuanhua; Deng, Mao; Shi, Yang; Yang, Chi; Mao, Xinchun; Wang, Zhijun

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 183-197. DOI: 10.1007/s11090-022-10282-y
2、Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma
Author: He, Yun-peng; Jin, Wei; Wang, Yi-bo; Lv, Shao-bo; Wang, Rui-sheng; Liu, Jun-qi; Liu, Hai-cheng

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 381-400. DOI: 10.1007/s11090-022-10295-7
3、Study on the Anticancer Effects of Plasma-Activated Saline Perfusion Based on a Microfluidic System
Author: Zhang, Jishen; Xu, Shengduo; Jing, Xixi; Liu, Dingxin; Zhang, Hao; Wang, Zifeng; Xu, Dehui; Zhang, Geng; Yang, Xiaojian; Wang, Xiaohua; Kong, Michael G.; Rong, Mingzhe

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 99-110. DOI: 10.1007/s11090-022-10297-5
4、A RF plasma source with focused magnetic field for material treatment
Author: Zhang, L. P.; Chang, L.; Yuan, X. G.; Zhang, J. H.; Zhou, H. S.; Luo, G. N.

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 329-345. DOI: 10.1007/s11090-022-10300-z
5、Influence Mechanism of O-2/H2O Adsorption on Cu(111) Surface on SF6 Overheating Failure Decomposition
Author: Zeng, Fuping; Kexin Zhu; Su, Dazhi; Feng, Xiaoxuan; Guo, Xinnuo; Yao, Qiang; Tang, Ju

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 67-80. DOI: 10.1007/s11090-022-10305-8
6、Synergistic 2,4-D Degradation by Fenton Reagent Obtained from Glow Discharge Plasma Formed H2O2 and DBD Pretreated Fe-Rich Sludge Catalyst
Author: Huang, Shaoyong; Huang, Quanjia; Gan, Jiaming; Li, Ting; Wang, Lei

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 2, pp. 491-511. DOI: 10.1007/s11090-022-10306-7
7、Hydrodeoxygenation of o-Cresol Over Mo2C Modified by O-2 Plasma
Author: Yu, Zihan; Yu, Zhiquan; Wang, Yao; Liu, Yingya; Wang, Anjie

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 2, pp. 533-545. DOI: 10.1007/s11090-022-10310-x
8、Theoretical Study on the Degradation Pathways of Unsymmetrical Dimethylhydrazine by Aqueous O-3
Author: Luo, Santu; Fu, Yuwei; Zhang, Mingyan; Liu, Yifan; Wang, Diankai; Zhang, Jiawei; Liu, Dingxin; Rong, Mingzhe

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 81-97. DOI: 10.1007/s11090-022-10307-6